The analysis of rare gas (M) diluted CH2F2使用四极质量谱镜（QMS）的血浆显示了CHF的特定形成2+离子稀释K k kr（KR）和CH2F+离子稀释氩（AR）。CHF的离子密度2+and CH2F+使用分离电离途径在CH中的冲突交换通道内估计2F2等离子体。在用AR稀释的等离子体中，CH的占主导地位2F+离子是由于C-F和AR的外观能量之间的解离电离引起的+(Figure 1).
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图1。Cross section for dissociative ionization for a CH2F2molecule.
对于用KR稀释的等离子体，C-H的外观能量是由于CHF的占主导地位2+离子，具有类似的电荷交换渠道，用于CH2F2and Kr+. According to the analytical results, adding Kr or Ar to CH2F2等离子体提供了对CHF分数密度的一定程度的控制2+and CH2F+ions (Figure 2).
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图2。个人ch2F+和瑞士法郎2+ion fraction on total CHXFy+离子密度在Kr-和AR二二键CH处2F2plasma.
Dissociative Ionization Pathways
Hydroflurocarbons have H atoms present, instead of the F atoms in flurorcarbon gases. Reactions of interest involving bonds between C-F and C-H are vital for density control of the reactive species. Dissociation of the C-F bond results in F atoms, which are a main etchant for Silicon (Si), whereas dissociation of the C-H bond produces H atoms, which allow polymers to be deposited on the substrate surface. To ensure accurate processing, species balance for deposition and etching is closely related and essential to the dissociation reactions in gas-phase.
实验中使用了双频率耦合等离子体（CCP）蚀刻反应器，A四极质谱仪（QMS）was installed on the wall of the chamber. A Kr or Ar gas mixture with CH2F2将气体引入反应室，并以非常高的频率（VHF）功率施加电极以保留等离子体。
Mass Spectrometric Measurements of Positive Ions
The measurements obtained from positive ion mass spectrometry indicate that CHF2+and CH2F+是主要的阳性离子。CHF产生的电离途径有两个通道2+and CH2F+ions. CH2F+通过C-H或C-F的键解离。F和H原子的中性电荷计数器片段是通过解离机制同时生成的。当CH的离子密度较大时，应考虑电子之间的碰撞2F+in plasma diluted with Ar gas. The collisions of charge exchange between ions of rare gases and molecules of CH2F2由于与KR（14 eV）和AR（16 eV）的外观能量的位置而发生。
Continuous studies are being carried out to elucidate reactions of dissociation in the plasma, through the diagnostics at gaseous phase used in mass-spectrometric measurements.
This information has been sourced, reviewed and adapted from materials provided by Hiden Analytical.
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