对金属氮化物形成的研究

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金属氮化物和硅化物的独特结构使这些材料具有高度吸引人的物理和化学特性，其中一些包括高硬度，低电阻率，高温稳定性和化学兼容性。欧洲杯足球竞彩尽管金属氮化金属膜的常见沉积方法包括真空弧蒸发，直接（DC）或无线电频繁（RF）磁铁反应性溅射，但2019年涂料论文讨论了扩展的血浆过程如何被证明是优越的。

Improving Thin Metal Film Properties

生产过程中薄金属膜中发生的化学反应可以在将这些薄膜纳入最终产品（例如超级电容器或太阳能电池）中时获得特定的特性。

Production techniques that allow for the development of multilayer films of transition metals, such as Ti-Mo systems, have been shown to exhibit greater electron transportation capability, capacitance, and high cycling stability; each of which are crucial properties for supercapacitor electrode materials.

The study discussed here demonstrated that thermochemical treatment of both nitrides and silicides in Mo-Ti bilayer films in expanding plasma gas mixtures supported the crystallization and growth of various phases, including Ti nitrides and Mo silicides.

扩展的血浆过程

In this work, the researchers deposited both Mo and Ti films on Si(100) wafers in an electron beam evaporator that was filled with argon (Ar) gas. With a total thickness equivalent to 250 nanometers (nm) each, the Mo-Ti bilayer films were then placed onto a heating substrate holder to allow the plasma nitriding process to occur. As the heat increased to as high as 800 °C, the Ar gas mixture was introduced into the vacuum chamber for three different time points: 1 hour, 1 hour and 30 minutes and 3 hours.

To evaluate the phase compositions and crystallization of the Mo-Ti bilayer films following completion of the expanding plasma process, the researchers utilized both X-ray diffraction (XRD) and Raman spectroscopy techniques. The XRD investigations demonstrated that TiN began to crystallize at 600°C, during which small crystallites were formed within the Mo-Ti layers. This phenomenon was hypothesized to occur as a result of the presence of Mo films between the Ti and Si layers.

当底物温度达到800°C时，MOSI₂layers appears to crystallize at 1 hour and 30 minutes. Overall, the more considerable amount of time that the films were exposed to the plasma process resulted in a more significant amount of growth of both the TiN and MoSi₂层。获得的拉曼光谱提供了相似的结果，这表明在600°C处理1小时30分钟时，Mo-Ti双层膜的结构良好。

结论

总体而言，这项研究的结果表明，在Si晶片上涂层时，Mo-Ti双层膜成分在加热至600°C和800°C并暴露于AR气体时表现出强大的跨各种接口的能力混合物。

Although the researchers anticipate that more studies will need to be performed to fully evaluate how the growth of both nitrides and silicides can be improved, the work presented here supports the use of an expanding plasma process for this purpose.

参考

1. Jauberteau，I.，Mayet，R.，Cornette，J.，Carles，P.，Manging，D.，Bessaudou，A.，等。（2019）。扩展血浆过程，用于硝化Mo-ti双层薄膜。涂料9(96).doi：10.3390/涂料9020096。

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