Brooks Instrument, a world leader in advanced flow, pressure, vacuum and vapor delivery solutions, will feature its newGP200 Seriespressure-based mass flow controller (P-MFC) at半欧罗巴, November 16-19, in Munich, Germany. The company will be exhibiting in booth B1572.
Image Credit: Brooks Instrument
The new GP200 Series is the industry’s first fully pressure-insensitive, pressure-based mass flow controller designed specifically for advanced etch and chemical vapor deposition processes in semiconductor manufacturing.
提供≤±1％的工艺气体准确性和≤±0.15％S.P.可重复性，超快GP200系列满足了TSV，MEMS和高通量连续等离子体过程的高纵横比蚀刻过程的关键要求。
GP200具有克服常规P-MFC的局限性的专利架构，旨在保持低蒸气压力和高压气体的准确流向从高于大气压力高的高真空运行的过程中。相比之下，传统的P-MFC需要高供应压力和低出口压力或迅速降解的性能。通过提供比常规P-MFC更大的灵活性，GP200系列是第一个基于通用压力的解决方案，也是传统P-MFC和热MFC的升级。
The GP200’s extreme pressure insensitivity and zero leak-by valve (ZLV) technology enables design engineers to reduce gas panel complexity, size and cost by eliminating the need for point-of-use pressure regulators and transducers.
In addition to its GP200 Series P-MFC, Brooks will showcase other key products such as vacuum and pressure measurement sensors, gauges and instrumentation used in wafer process equipment and fab gas distribution.
有关半导体应用的Brooks仪表产品和解决方案的全部信息，请访问www.brooksinstrument.com。
有关GP200系列P-MFC的更多信息，包括规格和视频，请访问experience.brooksinstrument.com/pressure-based-mass-flow-controller-gp200。